logo

For the Inventor, By the Inventor

Fremont, CA, United States of America

Wenli Z Collison

This inventor holds 14 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2000-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenli Z Collison. Retrieved from https://idiyas.com/inventor/wenli-z-collison

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14

% Patents Active = 78.6

Average Co-Inventor Count = 2.7

ph-index = 8

Forward Citations = 351(Granted Patents)


Company Filing History:

goldMedal14 out of 3,940 
 
Lam Research Corporation
 patents

Years Active: 2000-2015

Loading Chart...
14 patents (USPTO):Explore Patents
1. 9190302 - System and method for controlling plasma with an adjustable coupling to ground circuit (2015-11-17),
2. 8518211 - System and method for controlling plasma with an adjustable coupling to ground circuit (2013-08-27),
3. 8114246 - Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same (2012-02-14),
4. 7105102 - Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same (2006-09-12),
5. 7077971 - Methods for detecting the endpoint of a photoresist stripping process (2006-07-18),
6. 6716303 - Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same (2004-04-06),
7. 6692649 - Inductively coupled plasma downstream strip module (2004-02-17),
8. 6514378 - Method for improving uniformity and reducing etch rate variation of etching polysilicon (2003-02-04),
9. 6451158 - Apparatus for detecting the endpoint of a photoresist stripping process (2002-09-17),
10. 6388383 - Method of an apparatus for obtaining neutral dissociated gas atoms (2002-05-14),
11. 6257168 - Elevated stationary uniformity ring design (2001-07-10),
12. 6229264 - Plasma processor with coil having variable rf coupling (2001-05-08),
13. 6203657 - Inductively coupled plasma downstream strip module (2001-03-20),
14. 6052176 - Processing chamber with optical window cleaned using process gas (2000-04-18),

Title: The Innovative Contributions of Wenli Z Collison

Introduction

Wenli Z Collison is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on advanced systems for controlling plasma, which are crucial for various applications in the semiconductor industry.

Latest Patents

One of Wenli Z Collison's latest patents is titled "System and method for controlling plasma with an adjustable coupling to ground circuit." This innovative system includes a semiconductor chamber that comprises a powered electrode and another electrode, along with an adjustable coupling to a ground circuit. The powered electrode is designed to receive a wafer or substrate, while at least one grounded electrode generates an electrical connection with the powered electrode. The adjustable coupling to the ground circuit modifies the impedance of the grounded electrode, allowing for precise control over the ion energy of the plasma.

Career Highlights

Wenli Z Collison has built a successful career at Lam Research Corporation, where he has been instrumental in developing cutting-edge technologies. His expertise in plasma control systems has positioned him as a key figure in the advancement of semiconductor manufacturing processes.

Collaborations

Throughout his career, Wenli has collaborated with notable colleagues, including Tuqiang Q Ni and David J Hemker. These partnerships have fostered innovation and contributed to the successful development of various technologies in the semiconductor field.

Conclusion

Wenli Z Collison's contributions to plasma control systems and semiconductor technology highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…