The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Mar. 31, 1999
Applicant:
Inventors:
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 ; H05B 3/126 ;
U.S. Cl.
CPC ...
H01J 7/24 ; H05B 3/126 ;
Abstract
A coil for exciting an r.f. plasma in a vacuum plasma processing chamber includes plural radially and circumferentially extending turns connected between a pair of r.f. excitation terminals. In one embodiment, a drive mechanism varies r.f. field coupling coefficients between different radial and circumferential portions of the coil and the plasma. The drive mechanism includes plural drive shafts which drive different portions of the coil toward and away from the plasma. In a second embodiment, the drive mechanism drives an r.f. shield having at least one moving part for intercepting a portion of an r.f. plasma excitation field derived by the coil.