Zhejiang, China

Wenhua Yu

This inventor holds 1 USPTO granted patent. Top assignee: Najing Technology Corporation Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenhua Yu. Retrieved from https://idiyas.com/inventor/wenhua-yu-8zuata35

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of Wenhua Yu

Introduction

Wenhua Yu is a prominent inventor based in Zhejiang, China. He has made significant contributions to the field of optoelectronics, particularly through his innovative work on quantum dots. His research focuses on the preparation methods and applications of Group II-III-V-VI quantum dots.

Latest Patents

Wenhua Yu holds a patent for a "Group II-III-V-VI quantum dot, preparation method therefor and quantum dot optoelectronic device." This patent discloses a method for preparing Group II-III-V-VI quantum dots, which includes several steps involving the reaction of various precursor materials at controlled temperatures. The innovative approach enhances the efficiency and functionality of quantum dot optoelectronic devices.

Career Highlights

Wenhua Yu is associated with Nanjing Technology Corporation Limited, where he continues to advance his research in quantum dot technology. His work has positioned him as a key figure in the development of new optoelectronic materials.

Collaborations

Wenhua has collaborated with notable colleagues, including Peisheng Qiao and Jun Wang, who have contributed to his research endeavors and the advancement of quantum dot technologies.

Conclusion

Wenhua Yu's contributions to the field of quantum dots and optoelectronics highlight his innovative spirit and dedication to advancing technology. His work continues to influence the development of new materials and devices in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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