Singapore, Singapore

Weng Keong Choy

This inventor holds 1 USPTO granted patent. Top assignees: Agency for Science, Technology and Research, Ngee Ann Polytechnic, Singapore Polytechnic. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Weng Keong Choy. Retrieved from https://idiyas.com/inventor/weng-keong-choy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Weng Keong Choy: Innovator in Polymeric Film Technology

Introduction

Weng Keong Choy is a notable inventor based in Singapore, recognized for his contributions to polymeric film technology. He holds a patent that showcases his innovative approach to enhancing fluid flow and reducing biological material attachment on polymeric surfaces.

Latest Patents

Weng Keong Choy's most recent patent is titled "Polymeric film surface." This invention features a surface on a polymeric film that includes an array of patterned structures. These structures are designed to influence fluid flow across the surface, leading to a significant reduction in the attachment of biological materials.

Career Highlights

Throughout his career, Weng Keong Choy has worked with prominent organizations such as the Agency for Science, Technology and Research and Temasek Polytechnic. His experience in these institutions has allowed him to develop and refine his innovative ideas in the field of polymer science.

Collaborations

Weng Keong Choy has collaborated with several talented individuals, including Karen Siew Ling Chong and Yeong Yuh Lee. These partnerships have contributed to the advancement of his research and the successful development of his patented technology.

Conclusion

Weng Keong Choy's work in polymeric film technology exemplifies the impact of innovation in scientific research. His patent reflects a significant advancement in the field, showcasing his dedication to improving material properties for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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