Weng Aun Teh

Title: Weng Aun Teh: Innovator in Sputter Deposition Technology

Introduction

Weng Aun Teh is a notable inventor based in Teluk Kumbar, Malaysia. He has made significant contributions to the field of sputter deposition technology. His innovative work has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Weng Aun Teh holds a patent for a "Sputter deposition shield assembly to reduce cathode shorting." This invention features a shield assembly designed for a sputter deposition chamber. The assembly includes an outer sleeve with a gas inlet to conduct gas through the outer sleeve. Additionally, it has an inner sleeve that contains gas channels on a surface that mates with the outer sleeve. This design allows for efficient gas conduction between the inner and outer sleeves. The shield assembly also incorporates an aperture ring adjacent to the first end of both sleeves, which includes multiple gas outlets to facilitate gas flow toward a sputter target located within the deposition chamber. This innovative design aims to enhance the performance and reliability of sputter deposition processes.

Career Highlights

Weng Aun Teh is currently associated with Wd Media, LLC, where he applies his expertise in sputter deposition technology. His work has been instrumental in advancing the capabilities of the company in this specialized field.

Collaborations

Weng Aun Teh has collaborated with talented individuals such as Chichoy Lim and Eang Keong Tan. Their combined efforts have contributed to the successful development of innovative solutions in their area of expertise.

Conclusion

Weng Aun Teh is a distinguished inventor whose contributions to sputter deposition technology have made a significant impact. His patent for a shield assembly demonstrates his commitment to innovation and excellence in the field.