The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
May. 18, 2010
Chichoy Lim, Sg. Ara, MY;
Eang Keong Tan, Sungai Dua, MY;
Weng Aun Teh, Teluk Kumbar, MY;
Yi Chun Tan, Gelugor, MY;
Sheik Chian Lee, Pmtg Pauh, MY;
Chichoy Lim, Sg. Ara, MY;
Eang Keong Tan, Sungai Dua, MY;
Weng Aun Teh, Teluk Kumbar, MY;
Yi Chun Tan, Gelugor, MY;
Sheik Chian Lee, Pmtg Pauh, MY;
WD Media, LLC, San Jose, CA (US);
Abstract
A shield assembly for a sputter deposition chamber, the shield assembly including an outer sleeve with a gas inlet to conduct a gas through the outer sleeve and an inner sleeve disposed within the outer sleeve, the inner sleeve including gas channels on a surface mating with the outer sleeve to conduct the gas between the inner and outer sleeves. The shield assembly may further include an aperture ring adjacent to a first end of both the inner and outer sleeves, the aperture ring including a plurality of gas outlets to conduct the gas from the gas channels and an inner aperture flange extending from the plurality of gas outlets and adjacent to gas shield flange to form a gas runway for conducting the gas toward a sputter target located within the deposition chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile