Wenfei Gu

Title: Innovations by Wenfei Gu in Semiconductor Mask Inspection

Introduction

Wenfei Gu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of photolithographic mask inspection. His innovative work has led to the development of methods that enhance the accuracy and efficiency of semiconductor manufacturing processes.

Latest Patents

Wenfei Gu holds a patent titled "Polygon-based geometry classification for semiconductor mask inspection." This patent discloses methods and apparatus for providing feature classification for the inspection of a photolithographic mask. The design database for the fabrication of a mask includes polygons defined by a set of vertices. Polygons that abut each other are grouped together, and any grouped polygons are healed to eliminate interior edges, resulting in a polygon that corresponds to a covering region of the grouped polygons. Geometric constraints are specified to detect a plurality of feature classes, which are then used to identify defects in the mask. He has 1 patent to his name.

Career Highlights

Wenfei Gu is currently employed at Kla Tencor Corporation, a leading company in the semiconductor industry. His work at Kla Tencor has allowed him to apply his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

Wenfei Gu has collaborated with notable colleagues such as Yin Xu and Rui-Fang Shi. Their teamwork has fostered an environment of innovation and has led to significant advancements in their field.

Conclusion

Wenfei Gu's contributions to semiconductor mask inspection demonstrate his expertise and commitment to innovation. His patent and work at Kla Tencor Corporation highlight the importance of advancements in technology for the semiconductor industry.