Company Filing History:
Years Active: 2005-2006
Title: Wendy Nguyen: Innovator in Plasma Etching Technology
Introduction
Wendy Nguyen is a prominent inventor based in San Jose, CA. She has made significant contributions to the field of plasma etching technology, holding 2 patents that showcase her innovative approaches to etching processes.
Latest Patents
Wendy's latest patents include a method for bilayer resist plasma etch. This method involves etching a bilayer resist defined over a substrate in a plasma etch chamber. The process begins with introducing the substrate into the etch chamber, followed by the flow of SiCl gas. A plasma is then struck in the chamber while the gas flows, leading to the etching of the bilayer resist. Another notable patent is for methods and compositions for hardening photoresist in etching processes. This method includes curing the photoresist material with a bromine-containing plasma before carrying out the main etch of the wafer. The curing method ensures that the layer of the wafer beneath the photoresist material is not etched through.
Career Highlights
Wendy Nguyen is currently employed at Lam Research Corporation, where she continues to advance her research and development in plasma etching technologies. Her work has been instrumental in improving the efficiency and effectiveness of etching processes in semiconductor manufacturing.
Collaborations
Wendy collaborates with talented coworkers, including Chris Lee and Yousun Kim Taylor, who contribute to her innovative projects and research initiatives.
Conclusion
Wendy Nguyen's contributions to plasma etching technology reflect her dedication to innovation and excellence in her field. Her patents and work at Lam Research Corporation highlight her role as a leading inventor in the industry.