Beijing, China

Wenchao Zhao


 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2023

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4 patents (USPTO):

Title: Wenchao Zhao: Innovator in Photoinitiator Technology

Introduction

Wenchao Zhao is a prominent inventor based in Beijing, China. He has made significant contributions to the field of photoinitiators, with a focus on developing advanced materials for light-sensitive applications. His innovative work has led to the filing of several patents, showcasing his expertise and commitment to technological advancement.

Latest Patents

Wenchao Zhao holds 4 patents that reflect his innovative spirit. His latest patents include a "Trans, trans-diketone oxime ester isomer, manufacturing method thereof and application thereof." This patent describes a diketone oxime ester compound, which is utilized in a photo-curable composition. This composition exhibits extremely high light sensitivity and relatively low yellowing resistance, making it ideal for preparing color filters in light resistance devices such as display screens. Another notable patent is for a "Polyacrylate macromolecular photoinitiator, synthesis method therefor and use thereof." This invention focuses on a polyacrylate macromolecular photoinitiator that avoids low molecular weight components, thus preventing odor and migration contamination.

Career Highlights

Wenchao Zhao has worked with Insight High Technology (Beijing) Co. Ltd. and Insight High Technology Co., Ltd. His experience in these companies has allowed him to apply his innovative ideas in practical settings, contributing to advancements in photoinitiator technology.

Collaborations

Wenchao Zhao has collaborated with notable colleagues, including Jiaqi Li and Zhongli Ma. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Wenchao Zhao is a distinguished inventor whose work in photoinitiator technology has made a significant impact in the field. His patents demonstrate his innovative approach and dedication to advancing materials for light-sensitive applications.

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