Wen Yi Zhang

Title: Innovations by Inventor Wen Yi Zhang

Introduction

Wen Yi Zhang is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He holds two patents that showcase his expertise in advanced sample preparation techniques for transmission electron microscopy (TEM). His work is pivotal in enhancing the understanding of circuit layer structures.

Latest Patents

Wen Yi Zhang's latest patents include innovative methods for TEM sample preparation. The first patent, titled "TEM sample preparation from a circuit layer structure," describes a method that involves electron-beam assisted deposition of a protective layer over a site of interest, followed by ion-beam assisted deposition of a second protective layer. This method also includes ion-beam milling at the site of interest through both protective layers. The second patent, "Planar view TEM sample preparation from circuit layer structures," outlines a method for preparing a planar view TEM sample. This method involves polishing the substrate circuit layer structure until a cross-sectional polishing face reaches a first side face of the planar portion, forming a trench structure that exposes the top and bottom faces of the planar portion.

Career Highlights

Wen Yi Zhang is currently employed at Systems on Silicon Manufacturing Company Pte. Ltd., where he applies his innovative techniques to improve semiconductor manufacturing processes. His work has significantly contributed to advancements in the field, making him a valuable asset to his company.

Collaborations

Wen Yi Zhang collaborates with talented coworkers, including Weng Yee Kwong and Siew Khim Oh, who contribute to the innovative environment at their workplace.

Conclusion

Wen Yi Zhang's contributions to semiconductor manufacturing through his patented methods for TEM sample preparation highlight his role as a leading inventor in the field. His work continues to influence advancements in technology and research.