Hsinchu, Taiwan

Wen-Yi Liao

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014-2016

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3 patents (USPTO):Explore Patents

Title: **Wen-Yi Liao: Innovator in Semiconductor Technology**

Introduction

Wen-Yi Liao, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Liao is recognized for his innovative work in improving the efficiency and functionality of semiconductor devices. His most recent patent focuses on a specific type of device that addresses key challenges in the industry.

Latest Patents

One of Wen-Yi Liao's latest patents is centered around a lateral double diffused metal oxide semiconductor (LDMOS) device and its manufacturing method. This innovation encompasses several integral components, including a drift region, isolation oxide region, first and second oxide regions, a gate, a body region, a source, and a drain. Notably, the design features three oxide regions with specific thicknesses, where the second thickness is intentionally less than the first. This strategic configuration allows for a reduction in conduction resistance while maintaining the breakdown voltage of the LDMOS device, thereby enhancing overall device performance.

Career Highlights

Wen-Yi Liao is currently associated with Richtek Technology Corporation, where he continues to push the boundaries of semiconductor innovation. Throughout his career, Liao has established himself as a leading figure in his field, dedicating his expertise to the development of advanced technologies that bolster device efficiency.

Collaborations

In his professional journey, Liao has collaborated with notable coworkers such as Tsung-Yi Huang and Ching-Yao Yang. Together, they contribute to the innovative efforts at Richtek Technology Corporation, working on pioneering projects that advance semiconductor technology.

Conclusion

Wen-Yi Liao's work exemplifies the spirit of innovation in the semiconductor industry. With his recent advancements, he not only enhances the performance of semiconductor devices but also sets a foundation for future research and development. His dedication to technological advancement continues to inspire his peers and the next generation of inventors.

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