Hsinchu, Taiwan

Wen-Yao Wei

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023-2025

Loading Chart...
2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Wen-Yao Wei and His Contribution to EUV Technology**

Introduction

Wen-Yao Wei is an accomplished inventor based in Hsinchu, Taiwan, recognized for his contributions to the field of semiconductor manufacturing. He has developed a patent focusing on the advanced technology of extreme ultraviolet (EUV) lithography. His innovative work plays a crucial role in enhancing the precision of photomask applications in the production of integrated circuits.

Latest Patents

Wen-Yao Wei holds a patent for an "EUV pellicle and mounting method thereof on photo mask." This groundbreaking patent outlines a method for de-mounting a pellicle from a photomask. In his method, the photomask with the pellicle is positioned on a pellicle holder. The pellicle is affixed to the photomask through a plurality of microstructures. By applying a force or energy to these microstructures, they can be detached from the photomask, allowing for the pellicle to be removed without the need for a pulling force. Notably, these microstructures are engineered from an elastomer material, demonstrating a blend of innovation and practicality in semiconductor technology.

Career Highlights

Wei is associated with the Taiwan Semiconductor Manufacturing Company (TSMC), a leading global player in semiconductor manufacturing. His role at TSMC places him at the forefront of Taiwanese technology innovation, allowing him to contribute significantly to the advancements in EUV lithography and its application in semiconductor devices.

Collaborations

Wen-Yao has collaborated with talented colleagues such as Chi-Lun Lu and Hsin-Chang Lee, both of whom are instrumental in the ongoing development and refinement of semiconductor technologies. Their collective efforts underscore the collaborative spirit that drives innovation within TSMC.

Conclusion

Wen-Yao Wei's inventive work in developing a method for EUV pellicle and mounting reflects his profound impact on the semiconductor industry. His patent not only highlights technical ingenuity but also contributes to the advancement of manufacturing processes that are critical for the future of electronics. As the industry continues to evolve, inventors like Wen-Yao Wei play a pivotal role in pushing the boundaries of technology forward.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…