Hsinchu, Taiwan

Wen-Pin Liao

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):

Title: Innovations of Wen-Pin Liao in Chemical Mechanical Polishing

Introduction

Wen-Pin Liao is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP), with a focus on improving substrate processing techniques. With a total of 2 patents, Liao's work has enhanced the efficiency and effectiveness of CMP tools.

Latest Patents

Liao's latest patents include innovative apparatus and methods for chemical mechanical polishing. One of his patents describes a CMP tool and methods for planarizing a substrate. This invention features a substrate transporter designed to carry substrates among various polishers and cleaners within a CMP tool. The transporter ensures that substrates remain wet during transportation, preventing defects such as byproducts and slurry residues from accumulating on the substrate surface. This advancement significantly improves yields and device performance.

Another patent focuses on a chemical-mechanical planarization pad and methods of use. This implementation involves dispensing a slurry onto a polishing pad while it rotates. The rotation causes the slurry to flow radially outward toward the pad's outer edge. The polishing pad is designed with groove segments that impede the slurry's flow, enhancing the CMP process's overall effectiveness.

Career Highlights

Wen-Pin Liao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing CMP technologies, which are critical for producing high-quality semiconductor devices.

Collaborations

Liao has collaborated with several talented individuals, including Chih Hung Chen and Te-Chien Hou, who have contributed to his research and development efforts.

Conclusion

Wen-Pin Liao's contributions to chemical mechanical polishing have made a significant impact on the semiconductor industry. His innovative patents and ongoing work at Taiwan Semiconductor Manufacturing Company Limited highlight his dedication to advancing technology in this critical field.

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