Location History:
- Hsinchu County, TW (2019)
- Zhubei, TW (2023)
Company Filing History:
Years Active: 2019-2024
Title: Wen-Pin Ho: Innovator in Chemical Mechanical Polishing Technology
Introduction
Wen-Pin Ho is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 3 patents to his name, his work has had a considerable impact on the semiconductor manufacturing industry.
Latest Patents
One of Wen-Pin Ho's latest patents is a chemical mechanical polishing apparatus that utilizes a magnetically coupled pad conditioning disk. This innovative CMP apparatus features a polishing pad situated on the top surface of a platen, which is designed to rotate around a vertical axis. The apparatus includes a wafer carrier that holds a substrate on its bottom surface and presses it against the polishing pad. Additionally, a slurry dispenser is incorporated to dispense slurry over the polishing pad's surface. The pad conditioning unit consists of a conditioning disk and a conditioning head that holds the disk. The conditioning head is equipped with an electromagnet, while the pad conditioning disk contains a ferromagnetic material portion that is attracted to the electromagnet when energized.
Career Highlights
Wen-Pin Ho is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company has allowed him to further develop his expertise in CMP technology and contribute to advancements in semiconductor manufacturing processes.
Collaborations
Wen-Pin Ho has collaborated with several talented individuals in his field, including Ren-Hao Jheng and S P Cheng. Their combined efforts have led to innovative solutions and improvements in CMP technology.
Conclusion
Wen-Pin Ho's contributions to chemical mechanical polishing technology demonstrate his commitment to innovation and excellence in the semiconductor industry. His patents and collaborations reflect his significant role in advancing this critical area of technology.