Wen-Ming Chang

Title: The Innovations of Wen-Ming Chang

Introduction

Wen-Ming Chang is a notable inventor based in Zhunan, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a patent that addresses critical challenges in semiconductor manufacturing.

Latest Patents

Wen-Ming Chang holds a patent titled "Multi-layer polysilicon suppression of implant species penetration." This invention focuses on a blocking semiconductor layer that minimizes the penetration of implant species into a semiconductor layer beneath it. The design of the blocking semiconductor layer includes grains with relatively fine or small grain sizes and may incorporate a dopant in a low concentration. This innovative approach effectively reduces the penetration of implant species, enhancing the performance and reliability of semiconductor devices.

Career Highlights

Wen-Ming Chang is currently employed at Macronix International Co., Ltd., a leading company in the semiconductor industry. His work at Macronix has allowed him to collaborate with talented professionals in the field, further advancing semiconductor technology.

Collaborations

Some of his notable coworkers include Chun Chiang and Chun-Ming Cheng, who contribute to the innovative environment at Macronix International Co., Ltd. Their collective expertise fosters a culture of creativity and technological advancement.

Conclusion

Wen-Ming Chang's contributions to semiconductor technology through his patent and work at Macronix International Co., Ltd. highlight his role as an influential inventor in the industry. His innovative solutions continue to shape the future of semiconductor manufacturing.