This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Innovations of Wen-Lo Shieh in Differential Pressure Sensing Technology.
Introduction
Wen-Lo Shieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of differential pressure sensing devices. His innovative approach has led to the development of a unique patent that enhances the functionality and efficiency of pressure sensing technology.
Latest Patents
Wen-Lo Shieh holds a patent for a "Differential pressure sensing device and fabricating method therefor." This invention features a differential pressure sensing device with an active surface that includes an active region and a back surface with a recess. The process involves forming a sacrificial layer on the active region's surface, bonding the device to a carrier with a corresponding through-hole, and encapsulating the assembly with a molding compound. The sacrificial layer is then decomposed using a solvent, exposing the active region to the atmosphere and creating a differential pressure sensing device package with a through-hole.
Career Highlights
Wen-Lo Shieh is associated with the Industrial Technology Research Institute, where he has been instrumental in advancing research and development in sensor technologies. His work has not only contributed to academic knowledge but has also had practical applications in various industries.
Collaborations
Wen-Lo has collaborated with esteemed colleagues, including Jung-Tai Chen and Chun-Hsun Chu. Their combined expertise has fostered a productive research environment, leading to innovative solutions in their field.
Conclusion
Wen-Lo Shieh's contributions to differential pressure sensing technology exemplify the impact of innovative thinking in engineering. His patent reflects a significant advancement in the field, showcasing the potential for further developments in sensor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
