Hsinchu, Taiwan

Wen-How Wang

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Industrial Technology Research Institute. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-How Wang. Retrieved from https://idiyas.com/inventor/wen-how-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Wen-How Wang

Introduction

Wen-How Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of appearance modeling through his innovative patent. His work focuses on creating hierarchical models that enhance the understanding and representation of objects.

Latest Patents

Wang holds a patent titled "Methods and systems for creating a hierarchical appearance model." This patent describes a method for creating an appearance model of an object by receiving an image and developing a hierarchical structure from it. The model consists of multiple layers, with each layer containing nodes that provide varying levels of detail about the object. This innovative approach allows for a more nuanced representation of objects in various applications.

Career Highlights

Wen-How Wang is affiliated with the Industrial Technology Research Institute, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications in technology and design.

Collaborations

Wang collaborates with talented individuals such as Chih-Yang Lin and Yi-Ta Wu, who contribute to his projects and research initiatives. Their teamwork enhances the innovative potential of their work.

Conclusion

Wen-How Wang's contributions to the field of appearance modeling through his patent demonstrate his commitment to innovation and technology. His work continues to influence the way objects are represented and understood in various domains.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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