Chandler, AZ, United States of America

Wen Feng

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Other. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen Feng. Retrieved from https://idiyas.com/inventor/wen-feng-cn6ok96a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,601 
Other
 patents

Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Innovations by Inventor Wen Feng

Introduction

Wen Feng is an accomplished inventor based in Chandler, AZ (US). She has made significant contributions to the field of microelectronics, particularly through her innovative patent that addresses the challenges faced by microelectronic devices.

Latest Patents

Wen Feng holds a patent titled "Treatment for a microelectronic device and method of resisting damage to a microelectronic device using same." This patent involves a treatment that includes a dicing tape and a polymer composite film with added pigments or colorants. The film is designed to have a pre-cure glass transition temperature greater than 50° Celsius, and it can consist of multiple layers, with one layer being tacky and the other non-tacky at a specified temperature. She has 1 patent to her name.

Career Highlights

Throughout her career, Wen Feng has demonstrated a strong commitment to advancing technology in the microelectronics sector. Her innovative approaches have not only contributed to her field but have also paved the way for future advancements.

Collaborations

Wen Feng has worked alongside talented colleagues, including Leonel R Arana and Dingying David Xu. Their collaborative efforts have further enhanced the impact of her inventions.

Conclusion

Wen Feng's contributions to microelectronics through her innovative patent exemplify her dedication to the field. Her work continues to influence the development of technologies that protect and enhance microelectronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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