Taoyuan, Taiwan

Wen-Ding Chen

This inventor holds 3 USPTO granted patents. Top assignees: National Defense University, Chung Cheng Institute of Technology, National Defense University. Active years: 2010-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Ding Chen. Retrieved from https://idiyas.com/inventor/wen-ding-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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3 patents (USPTO):Explore Patents

Title: Wen-Ding Chen: A Pioneer in Metal Patterning Techniques

Introduction

Wen-Ding Chen, a skilled inventor based in Taoyuan, Taiwan, has made significant contributions to the field of material science, particularly in the realm of metal patterning techniques. With a total of three patents, Chen has been at the forefront of developing innovative methods that enhance manufacturing processes in various industries.

Latest Patents

Chen's latest patents showcase his expertise in forming metal patterns on substrates through advanced techniques. One of his prominent inventions is a method for forming a metal pattern via printing and electroless plating. This innovative process involves printing a specific pattern on the substrate with a specially designed ink composition, which is then dried before being treated with an electroless plating solution. The ink composition is carefully formulated using components that include a binder and a catalytic metal precursor, such as gold (Au), silver (Ag), palladium (Pd), platinum (Pt), or ruthenium (Ru).

Another notable patent by Chen focuses on metallization in conjunction with a copolymer deposited with particles of catalytic metal. This invention describes a method for forming a metal layer on a substrate using electroless plating while ensuring that the copolymer behaves differently based on temperature. The ingenuity behind this approach allows metallization both on surfaces and within the through-holes of substrates, enhancing the versatility of applications.

Career Highlights

Wen-Ding Chen has had an impressive career, holding influential positions at institutions such as National Defense University and Chung Cheng Institute of Technology, National Defense University. His work at these esteemed organizations has enabled him to advance his research while contributing to education and development in the field.

Collaborations

Throughout his career, Chen has collaborated with talented individuals, including colleagues Yuh Sung and Ming-Der Ger. These collaborations have played a vital role in refining his revolutionary methods and expanding the impact of his inventions.

Conclusion

Wen-Ding Chen’s innovation in metal patterning techniques stands as a testament to his dedication and expertise in the field. His patents not only contribute to technological advancements but also benefit a wide range of industries that rely on precise metallization techniques. As an inventor, Chen continues to push the boundaries of what is possible, paving the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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