Taoyuan, Taiwan

Wen-Chin Lin

This inventor holds 5 USPTO granted patents and 1 EPO patent. Top assignee: Everlight USA, Inc.. Active years: 2007-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Chin Lin. Retrieved from https://idiyas.com/inventor/wen-chin-lin-bsa8px1j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Taoyuan County, TW (2007 - 2008)
  • Taoyuan Hsien, TW (2008 - 2013)
  • Taoyuan, TW (2013)

Company Filing History:


Years Active: 2007-2013

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5 patents (USPTO):Explore Patents

Title: Exploring the Innovations of Inventor Wen-Chin Lin

Introduction

Wen-Chin Lin, based in Taoyuan Hsien, Taiwan, is a notable inventor recognized for his contributions to the ink and dyeing industries. With a portfolio of five patents, he has developed significant innovations that enhance printing and dyeing processes, reflecting his commitment to advancing technology in these fields.

Latest Patents

Wen-Chin Lin's latest patents include two remarkable inventions. The first is a black ink composition designed for high compatibility with printing nozzles. This composition is unique as it comprises a dispersive black colorant, less than 1 wt % of a glycol ether compound, a solvent, and water, all while being free of surfactants. As a result, it offers excellent smoothness in printing and produces high-quality images.

The second patent concerns a reactive printing dye and its aqueous composition application. This innovative dye composition includes at least one reactive dye, an organic buffer, and either mirabilite or a dispersant. It is specifically engineered for fabric dyeing, facilitating the coloring of a variety of materials such as cotton, silk, and wool. This reactive printing dye composition exhibits high stability under elevated pH values, ensuring minimal degradation in dyeing strength and enhanced storage stability.

Career Highlights

Wen-Chin Lin is currently associated with Everlight USA, Inc., a company known for its advancements in lighting and color technologies, which aligns with his innovative pursuits in ink and dye formulations. His work greatly contributes to the company’s mission of enhancing product performance and quality.

Collaborations

In his career, Wen-Chin has collaborated with esteemed colleagues, including Tzu-Kwei Sun and Chien-Wen Lee. Tzu-Kwei Sun brings expertise in various chemical applications, while Chien-Wen Lee, a talented woman in the field, adds a collaborative spirit that fosters innovation in their joint projects.

Conclusion

Wen-Chin Lin exemplifies how dedicated inventors can make a significant impact on industries through their innovative solutions. His recent patents underscore the importance of developing advanced materials that not only satisfy market needs but also push the boundaries of technology in printing and dyeing applications. As he continues to collaborate with talented peers at Everlight USA, Inc., the future promises more groundbreaking advancements from this remarkable inventor.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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