Vancouver, WA, United States of America

Weiyun Sun

This inventor holds 17 USPTO granted patents and 4 published patent applications and 2 EPO patents, primarily in Printing Technology. Top assignees: Hewlett-Packard Development Company, L.p., University of Washington. Active years: 2004-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Weiyun Sun. Retrieved from https://idiyas.com/inventor/weiyun-sun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 76.5

 

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 167(Granted Patents)


Location History:

  • Seattle, WA (US) (2004 - 2008)
  • Vancouver, WA (US) (2004 - 2024)

Company Filing History:


Years Active: 2004-2024

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Areas of Expertise:
Continuous Mode Printing
Color Conversion
Printer Maintenance
Density Classifiers
Fluid Ejection
Image Registration
Multi-Carriage Printing
Die-to-Die Boundary
VLIW Instruction Compression
Serial Bus Mastering
Data Transfer Coprocessor
Streaming Data
17 patents (USPTO):Explore Patents

Title: The Innovative Mind of Weiyun Sun

Introduction: Weiyun Sun, a talented inventor based in Vancouver, WA, is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Weiyun Sun holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly world.

Career Highlights: With a background in engineering and a passion for problem-solving, Weiyun Sun has led numerous successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Weiyun Sun has collaborated with leading research institutions, universities, and tech companies to bring his ideas to life and make a lasting impact on society.

Conclusion: Weiyun Sun's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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