Weiye Zhu

Title: Weiye Zhu: Innovator in FinFET Technology

Introduction

Weiye Zhu is a prominent inventor based in Fremont, CA, known for his contributions to semiconductor technology. He has made significant strides in the field of atomic layer deposition and etching processes, particularly in the formation of fin field effect transistors (FinFETs). His innovative work has led to advancements that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Weiye Zhu holds a patent titled "Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation." This patent describes methods and apparatuses for passivating a FinFET semiconductor device and performing a gate etch using integrated atomic layer deposition (ALD) and etch processes. The methods include performing a partial gate etch, depositing a passivation layer on exposed surfaces of semiconductor fins and a gate layer by ALD, and executing a final gate etch to form one or more gate structures of the FinFET semiconductor device. Notably, the etch, deposition, and etch processes are performed in the same plasma chamber, which streamlines the manufacturing process. The passivation layer is crucial as it is deposited on the sidewalls of the gate layer to maintain the gate profile during etching.

Career Highlights

Weiye Zhu is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced semiconductor manufacturing technologies. With a focus on innovation, he continues to contribute to the evolution of FinFET technology.

Collaborations

Throughout his career, Weiye Zhu has collaborated with notable colleagues, including Xiang Zhou and Ganesh Upadhyaya. These collaborations have fostered a productive environment for innovation and have led to significant advancements in semiconductor technology.

Conclusion

Weiye Zhu's contributions to the field of semiconductor technology, particularly through his patent on FinFET formation, highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in semiconductor manufacturing.