Weiye He

Title: Weiye He: Innovator in Semiconductor Technology

Introduction

Weiye He is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in enhancing the adhesion between metal and dielectric layers in semiconductor devices.

Latest Patents

Weiye He holds a patent titled "Method for BEOL metal to dielectric adhesion." This innovative method promotes adhesion between a dielectric layer of a semiconductor device and a metal fill deposited within a trench in the dielectric layer. The process involves performing an ion implantation where an ion beam formed of an ionized dopant species is directed into the trench at an acute angle relative to the top surface of the dielectric layer. This technique forms an implantation layer in the sidewall of the trench, allowing the metal fill to adhere effectively to the sidewall.

Career Highlights

Weiye He is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing advanced materials and processes that enhance the performance and reliability of semiconductor devices.

Collaborations

He has collaborated with notable colleagues, including Qintao Zhang and Jun-Feng Lu, who share his commitment to innovation in semiconductor technology.

Conclusion

Weiye He is a key figure in the semiconductor industry, with a focus on improving metal-dielectric adhesion through innovative methods. His contributions continue to shape the future of semiconductor technology.