WeiWu Zhong

Title: Innovations of WeiWu Zhong in Plasma Processing Technology

Introduction

WeiWu Zhong is a notable inventor based in San Jose, California. He has made significant contributions to the field of substrate processing systems, particularly in the area of plasma technology. His innovative work focuses on improving the efficiency and effectiveness of plasma processes in semiconductor manufacturing.

Latest Patents

WeiWu Zhong holds a patent for a technology titled "RF power compensation to reduce deposition or etch rate changes in response to substrate bulk resistivity variations." This patent describes a substrate processing system that includes a plasma generator configured to supply radio frequency (RF) power to an electrode in a processing chamber. The system features a sensor that detects parameters of the RF power supplied to the electrode. A controller compensates for variations in the plasma process rate due to changes in the bulk resistivity of the substrate. This is achieved by adjusting the RF power parameters based on the sensed data during the plasma processing of the substrate.

Career Highlights

WeiWu Zhong is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his expertise in plasma processing and contribute to advancements in semiconductor manufacturing technologies.

Collaborations

Throughout his career, WeiWu Zhong has collaborated with several talented individuals, including Wei Yi Luo and Youn Gi Hong. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

WeiWu Zhong's contributions to plasma processing technology exemplify the importance of innovation in the semiconductor industry. His patent and work at Lam Research Corporation highlight his role as a key inventor in advancing substrate processing systems.