Louisville, CO, United States of America

Weimei Luo Gheleta

This inventor holds 1 USPTO granted patent. Top assignee: Lexmark International, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Weimei Luo Gheleta. Retrieved from https://idiyas.com/inventor/weimei-luo-gheleta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Weimei Luo Gheleta

Introduction

Weimei Luo Gheleta is a remarkable inventor based in Louisville, Colorado. With a keen focus on advancing recycling technology, she has made significant contributions to the field of electrophotographic processes. Her innovative approach to photoconductor recycling highlights her commitment to sustainability and efficiency.

Latest Patents

Weimei has been granted a patent for her invention titled "Selective Removal of Photoreceptor Coatings by Ultrasonification." This patent discloses a method for recycling photoconductors where the charge transport layer is selectively removed without affecting the electrical properties of the charge generating layer. By utilizing specially selected solvents, such as dibasic esters, and applying ultrasonic energy for no more than 15 minutes, her method allows for the recycled drum to be recoated and reused, promoting a more sustainable approach in the industry.

Career Highlights

She currently works at Lexmark International, Inc., a well-known company in the imaging and printing solutions industry. Throughout her career, Weimei has not only demonstrated exceptional innovation but also a strong understanding of the technical aspects behind her inventions. Her patent showcases her ability to merge practical application with environmentally conscious technology.

Collaborations

Weimei has collaborated with notable colleagues including David Glenn Black and Ronald Harold Levin. These collaborations reflect a teamwork-oriented approach in her projects, which often lead to groundbreaking developments in recycling methodologies within the processing of photoconductors.

Conclusion

Weimei Luo Gheleta stands out as an inventive force in the field of recycling technology. With her innovative patent and collaborative spirit, she continues to pave the way towards more responsible, efficient practices in the electrophotographic process industry. Her contributions are invaluable, and her journey inspires future inventors to explore sustainable solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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