Guangzhou, China

Weijian Li

This inventor holds 1 USPTO granted patent. Top assignee: Guangdong Polytechnic Normal University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Weijian Li. Retrieved from https://idiyas.com/inventor/weijian-li-nixu9dfy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Weijian Li: Innovator in Binary Dot Matrix Code Identification

Introduction

Weijian Li is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of image processing and identification technologies. His innovative work focuses on enhancing the methods for recognizing binary dot matrix codes on mold surfaces.

Latest Patents

Weijian Li holds a patent titled "Method for identifying binary dot matrix code on mold surface." This patent describes a comprehensive process that involves capturing multiple images of binary dot matrix codes, training a YOLOv8 network model, and utilizing advanced detection techniques to decode binary-encoded sequence data. The method emphasizes the importance of accurate image processing and transformation to achieve reliable results.

Career Highlights

Weijian Li is affiliated with Guangdong Polytechnic Normal University, where he contributes to research and development in his field. His work not only showcases his technical expertise but also reflects his commitment to advancing technology in image recognition.

Collaborations

Weijian Li collaborates with esteemed colleagues such as Peng Liang and Hong Zhang. Their combined efforts in research and innovation further enhance the impact of their work in the field.

Conclusion

Weijian Li's contributions to the identification of binary dot matrix codes represent a significant advancement in image processing technology. His innovative methods and dedication to research continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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