Weihong Fan

Title: Weihong Fan and Semiconductor Light-Emitting Technology.

Introduction

Weihong Fan is an inventor associated with Xiamen, China, and Xiamen Silan Advanced Compound Semiconductor Co., Ltd. Her patent work includes a semiconductor light-emitting element designed to improve quantum efficiency, light-emission uniformity, and resistance to electrostatic discharge.

Latest Patents

Fan is credited with 1 patent: “Semiconductor Light Emitting Element and Manufacture Method Thereof.” The invention describes a device built from a substrate, an n-type semiconductor layer, a quantum well layer, and a p-type semiconductor layer. It also incorporates surface-plasmon-related layers in specified positions within or above the semiconductor structure. The patent presents these arrangements as a way to improve quantum efficiency and enhance the uniformity and electrostatic-discharge capability of the light-emitting element.

Career Highlights

Fan’s listed patent activity is connected to compound-semiconductor development at Xiamen Silan Advanced Compound Semiconductor Co., Ltd. Her invention focuses on the structure and manufacture of semiconductor light-emitting devices.

Collaborations

Jinjian Zheng and Moran Gao are identified as Fan’s coworkers. Their names provide context for the professional environment associated with her work, though the supplied information does not specify their roles in the patent.

Conclusion

Weihong Fan’s patent describes a semiconductor light-emitting design that uses surface-plasmon-related layers to target improved efficiency, emission uniformity, and electrostatic-discharge performance.