Weidong Wang

Title: Weidong Wang: Innovator in Charged Particle Beam Technology

Introduction

Weidong Wang is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of lithography through his innovative methods and apparatuses. With a total of 2 patents, his work focuses on enhancing the precision and efficiency of charged particle beam technology.

Latest Patents

Wang's latest patents include a method and apparatus that determines charged particle beam shape codes. This lithography method represents a substrate surface as gray level values and determines shape data that specifies the shape and position of a flash field. The apparatus receives a pattern in vector format, represents the substrate surface as a grid of pixels, and then represents each pixel as a gray level value specifying the proportion of the pixel that includes the pattern. Subsequently, the apparatus constructs a matrix of a quadrant of four pixels and surrounding pixels, modifies the matrix to provide three intermediate shapes corresponding to an exposed region of the quadrant, determines intermediate shape data of the quadrant, and performs a reverse modification on the shape to determine the shape data that specifies a flash field.

Another significant patent is related to a raster-shaped beam and an electron beam exposure strategy using a two-dimensional multipixel flash field. This invention involves an electron beam column that exposes a surface to variable shapes in a raster scan. The beam column includes an electron source that generates a charged particle beam, a transfer lens, and various apertures and deflectors to shape the beam as desired. The combination of upper and lower apertures enables the definition of exterior and interior corners, as well as horizontal and vertical edges of a pattern, ensuring that only one flash needs to be exposed in any one location on the surface.

Career Highlights

Throughout his career, Weidong Wang has worked with prominent companies such as Applied Materials, Inc. and Etec Systems, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in lithography technology.

Collaborations

Wang has collaborated with notable professionals in the field, including Stephen A. Rishton and Volker Boegli. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Weidong Wang's contributions to charged particle beam technology and lithography are significant. His innovative patents and career achievements reflect his dedication to advancing