Company Filing History:
2 out of 832,718 Years Active: 2015
Title: Weichong Du: Innovator in Photolithography Systems
Introduction
Weichong Du is a notable inventor based in Burnaby, Canada, recognized for his contributions to the field of photolithography systems. With a total of two patents to his name, Du has made significant advancements in the technology used for flat panel displays.
Latest Patents
Du's latest patents include the "Ultra-large size flat panel display maskless photolithography system and method." This innovative system features multiple maskless optical engines arranged in an (N×M) matrix that project patterns onto a substrate. The first stage system drives the optical engines in one direction, while the second stage system holds and moves the substrate in a perpendicular direction. A control system processes data to synchronize the movements of both stages, complemented by a vision system that detects the positions of the second stage to ensure accurate alignment with the optical engines.
Another significant patent is the "Double-sided maskless exposure system and method." This system incorporates light sources with two wavelength segments and maskless optical engines that utilize a 2D spatial light modulation device, such as a Digital Micromirror Device (DMD). The system is designed to pattern both sides of a moving substrate simultaneously, featuring auto-calibration functions to correct alignment errors in real-time. This innovative approach allows for the creation of contiguous images on both sides of the substrate.
Career Highlights
Throughout his career, Weichong Du has demonstrated a commitment to advancing photolithography technology. His work has positioned him as a key figure in the development of maskless exposure systems, which are crucial for modern display manufacturing.
Collaborations
Du has collaborated with notable colleagues, including Wenhui Mei and Lujie Qu, contributing to the advancement of their shared field of expertise.
Conclusion
Weichong Du's innovative patents and contributions to photolithography systems highlight his role as a significant inventor in the industry. His work continues to influence the development of advanced display technologies.
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