Wei Ying Doreen Yong

Title: Wei Ying Doreen Yong: Innovator in Semiconductor Processing

Introduction

Wei Ying Doreen Yong is a notable inventor based in Singapore, recognized for his contributions to semiconductor processing technology. He has developed innovative methods that enhance the etching process of silicon-containing materials, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

Wei Ying Doreen Yong holds a patent for "Isotropic silicon nitride removal." This patent describes exemplary methods of etching a silicon-containing material, which includes flowing a first fluorine-containing precursor and a sulfur-containing precursor into a remote plasma region of a semiconductor processing chamber. The process involves forming a plasma to generate plasma effluents that are then flowed into a processing region where a substrate is positioned. This substrate may include a trench formed through stacked layers of silicon nitride and silicon oxide. The innovative methods allow for isotropic etching of silicon nitride layers while substantially maintaining the integrity of the silicon oxide layers.

Career Highlights

Wei Ying Doreen Yong is currently employed at Applied Materials, Inc., a leading company in the field of semiconductor manufacturing equipment. His work focuses on advancing technologies that improve the efficiency and effectiveness of semiconductor processing.

Collaborations

Throughout his career, Wei Ying Doreen Yong has collaborated with esteemed colleagues, including Mikhail Korolik and Paul E Gee. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Wei Ying Doreen Yong's innovative work in semiconductor processing exemplifies the importance of advancements in technology for the manufacturing sector. His contributions continue to influence the field and pave the way for future innovations.