Jiangsu, China

Wei Ye

This inventor holds 1 USPTO granted patent. Top assignee: Nantong University. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Ye. Retrieved from https://idiyas.com/inventor/wei-ye-0wrrabtv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Wei Ye - Innovator in Stealth Fiber Technology

Introduction

Wei Ye is a prominent inventor based in Jiangsu, China. He has made significant contributions to the field of materials science, particularly in the development of advanced fiber technologies. His innovative work focuses on creating fibers that possess both infrared and radar stealth capabilities.

Latest Patents

Wei Ye holds a patent for "Skin-core structure fibers with both infrared and radar stealth, preparation method therefor, and use thereof." This patent describes a unique fiber structure where the core material consists of specific raw materials, including paraffin, an electromagnetic wave absorbent, and a high-molecular polymer. The fibers are designed to be spun from a core material combined with a skin-layer material, enhancing their stealth properties.

Career Highlights

Wei Ye is affiliated with Nantong University, where he continues to engage in research and development in the field of advanced materials. His work has garnered attention for its potential applications in various industries, including defense and telecommunications.

Collaborations

Wei Ye collaborates with notable colleagues such as Xing Zhang and Qilong Sun, contributing to a dynamic research environment that fosters innovation and discovery.

Conclusion

Wei Ye's contributions to stealth fiber technology exemplify the intersection of innovation and practical application. His work not only advances scientific understanding but also holds promise for future technological developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…