Jilin, China

Wei Wu



Average Co-Inventor Count = 7.8

ph-index = 1


Company Filing History:


Years Active: 2018-2025

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2 patents (USPTO):Explore Patents

Title: Wei Wu: Innovator in Irradiation Technology and Metalporphyrin Complexes

Introduction

Wei Wu is a prominent inventor based in Jilin, China. He has made significant contributions to the fields of irradiation technology and metalporphyrin complexes. With a total of 2 patents, his work has the potential to impact various applications in medical and chemical industries.

Latest Patents

Wei Wu's latest patents include an innovative irradiation terminal based on a combination of rotating beam lines. This terminal comprises a rotating gantry and an operation room, allowing for irradiation at different angles. The design addresses challenges in the application and promotion of irradiation devices, offering advantages such as multiple operation rooms, various irradiation angles, low construction costs, and reduced area occupancy. This universal ion irradiation terminal design significantly improves treatment efficiency and lowers treatment costs.

Another notable patent is related to a metalporphyrin complex, which includes a preparation method and a method for preparing polycarbonate. The complex features a structure that enhances catalytic activity in the polymerization reaction of carbon dioxide and an epoxide. This advancement represents a significant improvement over prior art in the field.

Career Highlights

Wei Wu is affiliated with the Chinese Academy of Sciences, where he conducts his research and development. His work is characterized by a commitment to innovation and excellence in scientific inquiry.

Collaborations

Wei Wu has collaborated with notable colleagues, including Jiancheng Yang and Yajun Zheng. Their combined expertise contributes to the advancement of their respective fields.

Conclusion

Wei Wu's contributions to irradiation technology and metalporphyrin complexes highlight his role as an influential inventor. His innovative patents reflect a dedication to improving efficiency and reducing costs in critical applications.

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