Hsinchu, Taiwan

Wei-Ting Kuo

This inventor holds 1 USPTO granted patent. Top assignee: Episil Technologies Inc.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei-Ting Kuo. Retrieved from https://idiyas.com/inventor/wei-ting-kuo-9y5mu5w7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Wei-Ting Kuo in Semiconductor Technology

Introduction

Wei-Ting Kuo is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work has led to the development of innovative devices that enhance the performance and reliability of electronic components.

Latest Patents

Wei-Ting Kuo holds a patent for a semiconductor device and complementary metal-oxide-semiconductor field effect transistor. This patent describes a semiconductor device that includes a substrate, an epitaxial layer, a sinker, an active device, a first buried layer, and a second buried layer. The configuration of these components is designed to prevent latch-up, which is a critical issue in semiconductor devices.

Career Highlights

Kuo's career is marked by his role at Episil Technologies Inc., where he has been instrumental in advancing semiconductor technologies. His expertise in the field has allowed him to develop innovative solutions that address common challenges in semiconductor design and manufacturing.

Collaborations

Throughout his career, Wei-Ting Kuo has collaborated with esteemed colleagues such as Shih-Kuei Ma and Chung-Yeh Lee. These collaborations have fostered a productive environment for innovation and have contributed to the success of their projects.

Conclusion

Wei-Ting Kuo's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patent and collaborative efforts highlight the importance of teamwork in driving advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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