Wei-Te Cheng

Title: **Innovations of Inventor Wei-Te Cheng in Semiconductor Metrology**

Introduction

Wei-Te Cheng, an accomplished inventor based in Taichung, Taiwan, holds two significant patents in the field of semiconductor manufacturing. His innovative work primarily focuses on enhancing metrology processes, vital for improving the accuracy and efficiency of semiconductor fabrication.

Latest Patents

Cheng's latest patents include advanced methods for overlay measurement and quick adjustments of metrology parameters. The first patent, titled “Overlay measurement using multiple wavelengths,” presents a novel approach to determine overlay in semiconductor wafers by capturing images from different layers of a target. This method utilizes radiation of multiple wavelengths to analyze differential signals from the captured images, allowing for a precise calculation of the overlay across respective pixels. The second patent focuses on the “Quick adjustment of metrology measurement parameters according to process variation.” This patent outlines a method to adjust metrology parameters during operation, minimizing delays caused by process variations while enhancing the production efficiency by utilizing models to assess the impacts of different factors on measurements.

Career Highlights

Wei-Te Cheng has contributed significantly to the semiconductor industry through his innovative solutions. He works at KLA-Tencor Corporation, a global leader in process control and yield management solutions. Cheng's inventions not only streamline manufacturing processes but also address challenges faced in metrology within semiconductor production. His work has the potential to revolutionize how measurements are conducted in the industry, driving advancements in the precision of semiconductor devices.

Collaborations

Throughout his career, Cheng has collaborated with esteemed colleagues such as Einat Peled and Eran Amit. These collaborations reflect a strong commitment to innovation and the pursuit of excellence in the field. Working together, they contribute to advancing technologies that enable more efficient and reliable semiconductor manufacturing processes.

Conclusion

Wei-Te Cheng is a promising inventor whose work in metrology for semiconductor manufacturing stands as a testament to the power of innovation in technology. His patents reflect a deep understanding of the challenges in the industry and provide robust solutions that enhance operational efficiencies. As semiconductor technology continues to evolve, inventors like Cheng play a crucial role in shaping the future of the industry.