Wei Tang

Title: Wei Tang: Innovator in Metal Nitride Technology

Introduction

Wei Tang is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for tuning film properties of metal nitrides. His innovative approach has implications for various applications in semiconductor manufacturing.

Latest Patents

Wei Tang holds a patent for a method titled "Method of tuning film properties of metal nitride using plasma." This patent describes a process for forming a metal nitride layer on a substrate. The method involves exposing a substrate with features to a first deposition gas mixture containing metal source material. This is followed by purging excess materials and exposing the substrate to a second gas mixture with a nitride source compound. The process concludes with the application of plasma using a microwave plasma source. This innovative technique enhances the quality and properties of metal nitride films.

Career Highlights

Wei Tang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that improve the efficiency and performance of electronic devices. With a patent portfolio that includes 1 patent, he continues to contribute to the field through research and development.

Collaborations

Throughout his career, Wei has collaborated with esteemed colleagues such as Srinivas Gandikota and Wenyi Liu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Wei Tang's contributions to the field of metal nitride technology exemplify the spirit of innovation. His patented methods are paving the way for advancements in semiconductor manufacturing, showcasing the importance of research and collaboration in driving technological progress.