This inventor holds 2 USPTO granted patents. Top assignee: Lockheed Martin Corporation. Active years: 2019-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019-2026
Title: Innovations of Wei Shih in Carbon-Carbon Composites
Introduction
Wei Shih is an accomplished inventor based in Yorba Linda, CA (US). He has made significant contributions to the field of materials science, particularly in the development of graded carbon-carbon composites. His innovative work addresses critical challenges in the performance of ablative materials.
Latest Patents
Wei Shih holds a patent for "Graded carbon-carbon composites with an integral ablative layer and methods for production thereof." This invention focuses on laminated carbon-carbon composites that can be used as ablative materials. Traditional laminated composites often face issues of delamination under thermal stress. Shih's invention introduces graded carbon-carbon composites that include a sacrificial or ablative layer integral with the underlying layers. This design not only mitigates delamination but also enhances the overall performance of the material. The composite features a densified base layer with a specific carbonaceous matrix and an outer ablative layer with higher porosity, which is crucial for its functionality.
Career Highlights
Wei Shih is currently employed at Lockheed Martin Corporation, where he continues to innovate in the field of advanced materials. His work is pivotal in developing solutions that meet the demanding requirements of aerospace applications.
Collaborations
Throughout his career, Wei has collaborated with notable colleagues, including Suraj Prakash Rawal and William H Willcockson. These collaborations have further enriched his research and development efforts.
Conclusion
Wei Shih's contributions to the field of carbon-carbon composites exemplify the importance of innovation in materials science. His patented work not only addresses existing challenges but also paves the way for future advancements in ablative materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
