Blacksburg, VA, United States of America

Wei Pan

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Sharp Kabushiki Kaisha Corporation, Cera M Gmbh, Virginia Tech Intellectual Properties Inc.. Active years: 1995-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Pan. Retrieved from https://idiyas.com/inventor/wei-pan-yqlo2eps

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1995-1999

Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Wei Pan: Innovator in Ferroelectric Materials

Introduction

Wei Pan is a notable inventor based in Blacksburg, VA (US). He has made significant contributions to the field of ferroelectric materials, holding a total of 3 patents. His innovative methods have advanced the technology surrounding layered structure oxides and reactive ion etching processes.

Latest Patents

One of Wei Pan's latest patents is focused on the dry etching of layered structure oxides. This method involves patterning layered structure oxide thin films by placing them in a chamber partially filled with CHClFCF3 gas. The process produces a glow discharge that etches the thin film ferroelectric material, achieving high etch rates, good etch anisotropy, and excellent etch uniformity. For instance, the etch rates for SBT and SBN thin films range from 2.5 to 17.5 nm/min, depending on the etch conditions. Additionally, minimal etch residues can be easily removed through low-temperature baking at 250°C. The method also ensures good etch selectivity and minimal surface damage.

Another significant patent involves the reactive ion etching of lead zirconate titanate and ruthenium oxide thin films. This method allows for the etching of both a lead zirconate titanate ferroelectric dielectric and a RuO2 electrode using an etching gas mixture of O2 with either CClF2 or CHClFCF3. This innovative approach has implications for the production of advanced semiconductor devices.

Career Highlights

Wei Pan has worked with prominent organizations, including Sharp Kabushiki Kaisha Corporation and Virginia Tech Intellectual Properties, Inc. His experience in these companies has contributed to his expertise in the field of ferroelectric materials and semiconductor technology.

Collaborations

Throughout his career, Wei Pan has collaborated with esteemed colleagues such as Seshu B Desu and Dilip P Vijay. These collaborations have further enriched his research and development efforts in innovative technologies.

Conclusion

Wei Pan's contributions to the field of ferroelectric materials and semiconductor technology are noteworthy. His innovative patents and collaborations highlight his role as a leading inventor in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…