Wei-Jyh Liu

Title: Innovations of Wei-Jyh Liu

Introduction

Wei-Jyh Liu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Liu has demonstrated his expertise and commitment to advancing technology.

Latest Patents

One of Liu's latest patents is a phase-shifting mask structure. This invention features a base plate with a pattern zone and a peripheral region. The design includes alignment-checking patterns and alignment slits, utilizing absolute light-blocking thin films to minimize alignment checking errors. This advancement allows for more precise alignment of mask layers, enhancing the overall efficiency of the manufacturing process.

Another notable patent involves a method for cleaning doped polycrystalline silicon surfaces. This method includes the use of a basic solution of hydrogen peroxide to clean the surface after doping with phosphorous. This innovative cleaning step addresses yield problems in the highly dense integrated circuit device process, allowing for improved patterning of the polycrystalline body.

Career Highlights

Wei-Jyh Liu is currently employed at United Microelectronics Corporation, where he continues to contribute to advancements in semiconductor technology. His work has been instrumental in developing processes that enhance the efficiency and reliability of integrated circuits.

Collaborations

Liu has collaborated with notable colleagues, including Chen-Hao Hwang and Lien-Sheng Chung. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Wei-Jyh Liu's contributions to the field of semiconductor technology through his patents reflect his dedication to innovation. His work continues to influence the industry, paving the way for future advancements in technology.