Evanston, IL, United States of America

Wei Huang

This inventor holds 1 USPTO granted patent. Top assignees: Flexterra, Inc., Northwestern University. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Huang. Retrieved from https://idiyas.com/inventor/wei-huang-qr7ol5gi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Wei Huang: Innovator in Charge-Transporting Thin Films

Introduction

Wei Huang is an accomplished inventor based in Evanston, IL (US). He has made significant contributions to the field of materials science, particularly in the development of charge-transporting metal oxide-polymer blend thin films. His innovative work has implications for the advancement of thin film transistors.

Latest Patents

Wei Huang holds a patent for "Charge-transporting metal oxide-polymer blend thin films." This invention relates to the integration of charge-transporting metal oxide-polymer blend thin films as semiconductor components or conductors in thin film transistors. The blend includes a semiconducting or conducting metal oxide lattice with an electrically insulating polymer, which is present at about 20% or less by weight of the metal oxide.

Career Highlights

Throughout his career, Wei Huang has worked with notable institutions, including Northwestern University and Flexterra, Inc. His experience in these organizations has allowed him to further his research and development in advanced materials.

Collaborations

Wei Huang has collaborated with esteemed colleagues such as Antonio Facchetti and Tobin Jay Marks. Their joint efforts have contributed to the advancement of technology in the field of thin films.

Conclusion

Wei Huang's innovative work in charge-transporting thin films showcases his expertise and dedication to advancing materials science. His contributions are paving the way for future developments in thin film technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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