Suzhou, China

Wei Huang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Innoscience (Suzhou) Technology Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Huang. Retrieved from https://idiyas.com/inventor/wei-huang-1raugqij

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Wei Huang - Innovator in Semiconductor Technology

Introduction

Wei Huang is a prominent inventor based in Suzhou, China. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs that enhance device performance. His work is characterized by a focus on improving the efficiency and functionality of semiconductor devices.

Latest Patents

Wei Huang holds a patent for a HEMT (High Electron Mobility Transistor) semiconductor device with a stepped sidewall. This semiconductor device includes a semiconductor substrate, first and second nitride-based semiconductor layers, source/drain (S/D) electrodes, a gate electrode, and a first passivation layer. The first nitride-based semiconductor layer is positioned over the semiconductor substrate, while the second nitride-based semiconductor layer, which has a greater bandgap than the first, forms a two-dimensional electron gas (2DEG) region. The S/D electrodes are placed over the second nitride-based semiconductor layer, and the gate electrode is situated between the S/D electrodes. The first passivation layer is located above the second nitride-based semiconductor layer. The edges of the first and second nitride-based semiconductor layers, along with the first passivation layer, create a stepped sidewall over the semiconductor substrate. This stepped sidewall features at least one laterally-extending portion with at least two riser portions connecting the laterally-extending portion.

Career Highlights

Wei Huang is currently employed at Innoscience Technology Co., Ltd., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Wei Huang collaborates with talented colleagues, including Yulong Zhang and Jue Ouyang. Their combined expertise fosters a creative environment that drives innovation in semiconductor technology.

Conclusion

Wei Huang is a key figure in the semiconductor industry, with a focus on developing advanced technologies that enhance device performance. His contributions, particularly in the area of HEMT devices, highlight his role as an innovator in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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