Wei-Hsin Lin

Title: Wei-Hsin Lin: Innovator in Wafer Level Lens Technology

Introduction

Wei-Hsin Lin is a prominent inventor based in Tainan, Taiwan. He is known for his contributions to lens technology, particularly in the field of wafer level lenses. His innovative approach has led to advancements that are significant in various applications.

Latest Patents

Wei-Hsin Lin holds a patent for a "Wafer level lens, lens sheet and manufacturing method thereof." This patent describes a method of manufacturing a lens sheet that includes several steps. The process begins with a first structure that consists of a first transparent substrate and a first lens film attached to it. A second structure is then introduced, which includes a second transparent substrate and a second lens film. The second transparent substrate features a first surface and a second surface opposite to the first surface. The second lens film is attached to the first surface, while the first lens film is attached to the second lens film. After this attachment, a third lens film is formed on the second surface of the second substrate. This innovative method also provides a lens sheet and a wafer level lens.

Career Highlights

Wei-Hsin Lin is currently employed at Himax Technologies, Inc., where he continues to develop cutting-edge technologies in lens manufacturing. His work has significantly impacted the industry, showcasing his expertise and dedication to innovation.

Collaborations

Wei-Hsin Lin collaborates with talented coworkers, including Yun-Lien Hsiao and Shu-Hao Hsu. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Wei-Hsin Lin is a notable inventor whose work in wafer level lens technology has made a significant impact. His innovative methods and collaborations continue to drive advancements in the industry.