Wei-Chieh Lien

Title: Innovations of Wei-Chieh Lien

Introduction

Wei-Chieh Lien is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of Wei-Chieh Lien's latest patents is a semiconductor device comprising an electron blocking layer. This innovative device includes a first semiconductor structure and a second semiconductor structure positioned on top of the first. An active region is situated between these two structures, which consists of a well layer and a barrier layer, with the barrier layer having a specific band gap. The design incorporates a first electron blocking layer that features a band gap greater than that of the barrier layer. Additionally, a first aluminum-containing layer is placed between the first electron blocking layer and the active region, which also has a band gap greater than that of the first electron blocking layer. The configuration ensures that the distance between the first aluminum-containing layer and the upper surface of the active region is maintained between 3 nm and 20 nm.

Another patent by Lien describes a semiconductor device that also includes an electron blocking layer. This device features multiple alternating well layers and first barrier layers within the active region. Each of the first barrier layers possesses a band gap, and the active region has both an upper surface facing the second semiconductor structure and a bottom surface opposite to it. The first electron blocking layer in this design has a band gap greater than that of one of the first barrier layers. Furthermore, a first aluminum-containing layer is situated between the first electron blocking layer and the active region, with a specified thickness and band gap. A second aluminum-containing layer is also included, positioned on the opposite side of the first electron blocking layer, ensuring that the ratio of the thicknesses of the two aluminum-containing layers falls between 0.8 and 1.2.

Career Highlights

Wei-Chieh Lien is currently employed at Epistar Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in various electronic devices.

Collaborations

Throughout his career, Lien has collaborated with notable colleagues, including Yung-Chung Pan and Chang-Yu Tsai. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

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