Chiayi, Taiwan

Wei-Chen Tien

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Metal Industries Research & Development Centre. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei-Chen Tien. Retrieved from https://idiyas.com/inventor/wei-chen-tien

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Wei-Chen Tien in Plasma-Assisted Technology.

Introduction

Wei-Chen Tien is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of plasma-assisted technology, particularly through his innovative patent. His work focuses on enhancing processes that involve high-temperature applications.

Latest Patents

Wei-Chen Tien holds a patent for a "Plasma-assisted annealing system and method." This system includes a high-temperature furnace, a plasma-induced dissociator, and a connecting duct. The plasma-induced dissociator is designed to dissociate a working gas and exhaust the dissociated working gas from its outlet. The connecting duct links the working gas outlet of the plasma-induced dissociator to the gas inlet of the high-temperature furnace. This innovative design allows the dissociated working gas to be introduced into the furnace efficiently.

Career Highlights

Wei-Chen Tien is associated with the Metal Industries Research & Development Centre, where he applies his expertise in developing advanced technologies. His work has been instrumental in improving industrial processes that rely on plasma technology.

Collaborations

He collaborates with talented coworkers, including Cheng-Yuan Hung and Chang-Sin Ye, who contribute to the research and development efforts at their institution.

Conclusion

Wei-Chen Tien's contributions to plasma-assisted technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to advancing industrial processes through scientific research and collaboration.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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