Wei Chang Huang

Title: Wei Chang Huang: Innovator in Semiconductor Polishing Technology

Introduction

Wei Chang Huang is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing head assemblies.

Latest Patents

Wei Chang Huang holds a patent for a "Polishing head assembly having recess and cap." This innovative polishing head assembly is designed for the polishing of semiconductor wafers. It features a polishing head with a recess along its bottom portion, which includes a recessed surface. The cap is strategically positioned within this recess and consists of an annular wall secured to the polishing head, along with a floor that is joined to the annular wall at a joint. The floor extends across the annular wall, creating a chamber between its upper surface and the recessed surface. Notably, a deformation resistance of a portion of the floor near the joint is weakened, allowing it to deflect relative to the polishing head in response to pressure changes within the chamber. This patent represents a significant advancement in semiconductor wafer polishing technology.

Career Highlights

Wei Chang Huang is associated with GlobalWafers Co., Ltd., a leading company in the semiconductor industry. His work at GlobalWafers has allowed him to focus on innovations that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Wei Chang Huang has collaborated with talented coworkers, including Chih Yuan Hsu and Jen Chieh Lin. Their combined expertise contributes to the advancement of technology within their field.

Conclusion

Wei Chang Huang's contributions to semiconductor polishing technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the efficiency of semiconductor manufacturing processes.