Wei C Hsie

Title: Innovations of Wei C Hsie

Introduction

Wei C Hsie is a notable inventor based in Eden Prairie, MN (US). He has made significant contributions to the field of magnetoresistive sensors, holding a total of 6 patents. His work has been instrumental in advancing technology in this area.

Latest Patents

One of his latest patents is for a planarized magnetoresistive sensor. This innovative sensor includes a track width oxide layer that overlies a magnetoresistive element. Etch stop layers are positioned on opposite sides of the magnetoresistive element, adjacent to it. Additionally, contact/boundary control layers overlie the etch stop layer and lie next to the track width oxide layer. A separate loft oxide layer is also present, which overlies the contact/boundary control layers and the track width oxide layer. The formation of the magnetoresistive sensor involves depositing a track width oxide to a thickness that matches the contact/boundary control layers.

Another patent focuses on the method of manufacturing a planarized magnetoresistive sensor. This method shares similarities with the previous patent, emphasizing the importance of the track width oxide layer and the arrangement of the etch stop layers and contact/boundary control layers.

Career Highlights

Wei C Hsie is currently employed at Seagate Technology Incorporated, where he continues to innovate and develop new technologies. His work at Seagate has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Michael M Collver and Nathan Curland. Their combined expertise contributes to the advancement of technology at Seagate.

Conclusion

Wei C Hsie's contributions to the field of magnetoresistive sensors are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing technology in this area.