Henderson, NV, United States of America

Wayne T Rundle

This inventor holds 1 USPTO granted patent. Top assignee: Valence Technology, Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wayne T Rundle. Retrieved from https://idiyas.com/inventor/wayne-t-rundle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 77(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Wayne T. Rundle: Innovator in Electrochemical Cell Fabrication

Introduction

Wayne T. Rundle is a notable inventor based in Henderson, NV (US). He has made significant contributions to the field of electrochemical cells, particularly through his innovative patent. His work focuses on improving the fabrication processes of these essential components in energy storage systems.

Latest Patents

Wayne T. Rundle holds a patent for "Methods of fabricating electrochemical cells." This patent describes a process where electrochemical cells with improved adhesion of the laminant components can be fabricated by forming an electrode directly on the surface of the electrolyte or separator film. This innovative approach eliminates the need to prepare the anode or cathode in a separate procedure, streamlining the manufacturing process.

Career Highlights

Rundle is associated with Valence Technology, Inc., where he applies his expertise in electrochemical technologies. His work has contributed to advancements in energy storage solutions, making them more efficient and reliable.

Collaborations

Wayne T. Rundle has collaborated with Krishna Menon, working together to enhance the development of electrochemical technologies.

Conclusion

Wayne T. Rundle's contributions to the field of electrochemical cell fabrication highlight his innovative spirit and dedication to advancing energy storage technologies. His patent reflects a significant step forward in the efficiency of manufacturing processes in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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