Company Filing History:
2 out of 13,684 
1 out of 164,108 
Years Active: 2006-2025
Title: Wayne R. Swart: Innovator in Semiconductor Processes
Introduction
Wayne R. Swart is a notable inventor based in Tivoli, NY (US), recognized for his contributions to semiconductor technology. With a total of 2 patents, he has made significant advancements in optimizing semiconductor processes.
Latest Patents
One of his latest patents is titled "Endpoint optimization for semiconductor processes." This invention involves a camera that captures reflected light from the surface of a wafer during processes that add or remove material, such as etching. The patent focuses on optimizing the camera's sampling rate and light source intensity to accurately determine the endpoint of the process. By characterizing light intensities reflected from the wafer, the system can adjust the light source intensity based on the wafer's complex patterns. Additionally, the camera sampling rates can be optimized to reduce spatial noise without unnecessary oversampling, resulting in a clean and repeatable trace for endpoint determination.
Another significant patent by Wayne is "Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers." This method involves a polishing system designed to planarize substrates with various materials. The process includes positioning the substrate near a polishing pad and dispensing a polishing fluid that has been carbonated before application. The polishing system features a polishing platen, a controller to manage the contact between the polishing pad and substrate, and a carbonation system for the polishing fluid.
Career Highlights
Wayne has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. and IBM. His experience in these organizations has contributed to his expertise in semiconductor processes and innovations.
Collaborations
Throughout his career, Wayne has collaborated with notable professionals such as Joseph F. Salfelder and Gopalakrishna B. Prabhu. These collaborations have further enriched his work and contributions to the field.
Conclusion
Wayne R. Swart's innovative patents and extensive experience in the semiconductor industry highlight his significant role in advancing technology. His work continues to influence the optimization of semiconductor processes, showcasing his dedication to innovation.
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