Doylestown, OH, United States of America

Wayne P Leavy

This inventor holds 1 USPTO granted patent. Top assignee: Goodyear Aerospace Corporation. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wayne P Leavy. Retrieved from https://idiyas.com/inventor/wayne-p-leavy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Wayne P. Leavy: Innovator in Aircraft Simulation Technology

Introduction

Wayne P. Leavy is a notable inventor based in Doylestown, OH (US). He has made significant contributions to the field of aircraft simulation technology. His innovative approach has led to the development of a unique system that enhances the limited field of view in aircraft simulators.

Latest Patents

Wayne P. Leavy holds a patent for an "Enhanced Limited Field of View Simulator." This system improves the experience of users by providing a more realistic simulation environment. The technology allows for the tracking of primary objects within a limited field of view, ensuring that they are fully represented as aircraft, targets, or runways. When these objects move outside the designated area, they are represented as light spots, which are extinguished once they return to the field of view.

Career Highlights

Wayne P. Leavy is associated with Goodyear Aerospace Corporation, where he applies his expertise in simulation technology. His work has been instrumental in advancing the capabilities of aircraft simulators, making them more effective for training and operational purposes.

Conclusion

Wayne P. Leavy's contributions to aircraft simulation technology exemplify the impact of innovative thinking in enhancing training systems. His patent reflects a commitment to improving the realism and functionality of simulators, which is crucial for the aviation industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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