This inventor holds 1 USPTO granted patent. Top assignee: Texas A&M University System. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Wayne N P Hung: Innovator in Magnetic-Abrasive Polishing Technology
Introduction
Wayne N P Hung is a notable inventor based in College Station, TX (US). He has made significant contributions to the field of polishing technology through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing processes using advanced materials and techniques.
Latest Patents
Wayne N P Hung holds a patent for a "Method and apparatus for performing targeted polishing via manipulation of magnetic-abrasive fluid." This invention features a magnetic field manipulated localized polishing system that includes a container holding a volume of magnetic abrasive fluid. The fluid contains abrasive particles, and a motor positioned under the container induces rotation of a magnet. This setup allows for precise polishing of a workpiece suspended in the container.
Career Highlights
Wayne is affiliated with The Texas A&M University System, where he contributes to research and development in his area of expertise. His work has implications for various industries that require high-precision polishing techniques.
Collaborations
Wayne has collaborated with esteemed colleagues such as Satish Bukkapatnam and Arun Srinivasa, enhancing the scope and impact of his research.
Conclusion
Wayne N P Hung's innovative approach to polishing technology exemplifies the intersection of engineering and practical application. His contributions continue to influence advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile