Sheffield, United Kingdom

Wayne Cranton

This inventor holds 1 USPTO granted patent. Top assignee: The Nottingham Trent University. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wayne Cranton. Retrieved from https://idiyas.com/inventor/wayne-cranton

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Wayne Cranton: Innovator in Surface Plasmon Resonance

Introduction

Wayne Cranton is a notable inventor based in Sheffield, GB. He has made significant contributions to the field of surface plasmon resonance, particularly in the development of thin films with unique properties. His work has implications for various applications in optics and materials science.

Latest Patents

Wayne Cranton holds a patent for "Surface plasmon resonance in thin films." This invention involves a thin film comprising a layer of dielectric material with electrically conductive inclusions. The thin film exhibits a first reflectivity due to surface plasmon resonance and is designed to provide one or more selected regions with a second reflectivity due to the same phenomenon.

Career Highlights

Wayne Cranton is affiliated with Nottingham Trent University, where he continues to engage in research and innovation. His work at the university allows him to explore advanced materials and their applications in various scientific fields.

Collaborations

Wayne has collaborated with esteemed colleagues, including Demosthenes Koutsogeorgis and Panos Patsalas. These collaborations have enriched his research and contributed to the advancement of knowledge in his area of expertise.

Conclusion

Wayne Cranton's innovative work in surface plasmon resonance highlights his role as a significant contributor to the field of materials science. His patent and collaborations reflect his commitment to advancing technology and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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